Pulse energy, repetition rate, pulse width
PS-D-266-Air266 nm deep-UV pulsed laser
266 nmPS-D-266-Air is a 266 nm Pulsed laser. Used for glass marking, sapphire marking, ceramic cutting, semiconductor cutting. Key specifications: output / average power 1~100 mW, pulse energy 1~12 uJ, repetition rate 1 kHz-10 MHz. View specifications, datasheet and enquiry options from Precisometer.
Specifications
PS-D-266-Air
21 specification rows
| Wavelength | 266 nm |
|---|---|
| Output / average power | 1~100 mW |
| Pulse energy | 1~12 uJ |
| Repetition rate | 1 kHz-10 MHz |
| Pulse width | ~10 ps |
| Ave power stability (rms, over 4 hours) | <3%,<2%, <1% |
| 1064/532/355/266nm Transverse mode | TEM00 |
| Beam divergence, full angle (mrad) | <3 |
| M2 | <1.2 |
| Warm-up time (minutes) | ≥30 |
| Cooling method | Air cooled |
| Operating voltage (VDC) | 24V/20.9A |
| Rep.rate | 1kHz-10MHz |
| Pulse duration (ps) | ~10 |
| Transverse mode | TEM00 |
| Beam Circularity (%) | >90 |
| Beam diameter at the at the aperture (1/e2, mm) | ~1.2 |
| M² | <1.2 |
| Polarization ratio | >100:1 Horizontal (Vertical optional) |
| Beam height from base plate (mm) | 90.5 |
| Operating temperature (℃) | 20-30 |
| Expected lifetime (hours) | >10000 |
Applications
Uses named on this model’s datasheet.
- Glass marking
- Sapphire marking
- Ceramic cutting
- Semiconductor cutting
- Solar panel coating
- Film scribing
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