7 models · 2 series
High Energy Laser |
2 models| Model | Wavelength | Pulse energy | Repetition rate | Pulse width | Cooling | |
|---|---|---|---|---|---|---|
| 213 | 213 nm | 1-100 uJ | 100 Hz-10 kHz | – | – | |
| EO-213-Subnano-Hi | 213 nm | 1–100 μJ at 5 kHz | 100 Hz-10 kHz | <1.5 ns / ~2 ns at 5 kHz, depending on variant | Air or Water cooled | Datasheet |
213nm UV Ultraviolet Laser.
5 models| Model | Wavelength | Output / average power | Pulse energy | Repetition rate | Pulse width | M² | Power stability (rms) | Pulse width (ps) | Jitter (ns, sdev) | Beam divergence, full angle (mrad) | Beam diameter (mm) | Rep. rate | Cooled method | Warm-up time (minutes) | Operating temperature (℃) | Power supply (110/220VAC) | Power stability (rms, 4 hours , ±3°C) | Beam diameter at the aperture 1/e2 (mm) | Power supply (12VDC) | Expected lifetime (hours) | Power stability (rms, 4 hours , ±3℃) | Peak power | Timing jitter (external trigger, standard deviation) | Power stability (rms, 4 h, ±3 °C) | Transverse mode | Beam diameter at the aperture (1/e²) | Beam divergence, full angle | Warm-up time | Beam height from base plate | Operating temperature | Power supply | AC input (configuration-dependent) | Expected lifetime | Applications | Configuration notes | Beam diameter at the aperture (mm) | Power supply (100-240VAC) | |
|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
| DPS-213-Pico | 213 nm | 1~30 mW | – | – | – | – | <5%, <3% | <50 | <1ns | <3 | ~2 | 5MHz | Air cooled | <15 | 15-30 | PSU-DPS-Pico | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | Datasheet |
| AO-U-213-DP | 213 nm | 1~5 mW | 0.3 uJ | – | – | – | – | – | – | – | – | – | Water cooled | <10 | 10-35 | – | <5%, <3% | <2.0 | 12V/25A | >10000 | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | Datasheet |
| EO-213-Subnano | 213 nm | 1~30 mW | 1~30 uJ | – | <2 ns @1 kHz | – | – | – | – | – | ~1.5mm | 1-5kHz | Air cooled | <15 | 15-30 | PSU-EO-Subnano | – | – | – | – | <5% | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | Datasheet |
| EO-S-213-RS | 213 nm | Up to 1 kHz: 1–5 mW | Up to 1 kHz: 1–5 μJ | 10 Hz–1 kHz | Up to 1 kHz: ~1.5 ns | <4.0 | – | – | – | – | – | – | – | – | – | – | – | – | – | – | – | Up to 1 kHz: 0.6–3.3 kW | <0.2 ns optional; standard jitter not specified in the UV datasheet | <5% / <3% | Near TEM00 | ~1.5 mm | <1.5 mrad | <10 minutes | 73 mm | 10–35 °C | PSU-EOM-DL; PSU-EOM-L optional for low-jitter operation. | 100–240 VAC in the UV series datasheet. Confirm the input rating of the supplied power supply. | >10000 hours | Laser ranging; lidar; Raman spectroscopy; ICP-MS; LIBS; scientific research. | Pulse duration is not tunable; it varies with energy and repetition rate. Maximum power, pulse energy and frequency are not simultaneous guarantees. | – | – | Datasheet |
| MPL-S-213-HP | 213 nm | 1~50 mW | 0.5~20 uJ | – | – | – | – | – | – | – | – | – | – | <5 | 10-35 | – | <5%, <3% | – | – | >10000 | – | – | – | – | Near TEM00 | – | – | – | – | – | – | – | – | – | – | ~1.5 | PSU-S-HP | Datasheet |
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