Sapphire marking
NS-FH-1064: Sapphire marking depends on how optical energy is delivered to the target; 1064 nm emission governs absorption, while the listed temporal parameter (200 uJ) governs peak intensity and heat deposition.
Pulse energy, repetition rate, pulse width
NS-FH-1064 is a 1064 nm Pulsed laser. Used for sapphire marking, ceramic cutting, semiconductor cutting, film scribing. Cooling: Water cooled. Key specifications: pulse energy 200 uJ, repetition rate 0.2-10 MHz, pulse width 2-10 ns @1.5 MHz. View specifications, datasheet and enquiry options from Precisometer.
Specifications
24 specification rows
| Pulse energy | 200 uJ |
|---|---|
| Repetition rate | 0.2-10 MHz |
| Pulse width | 2-10 ns @1.5 MHz |
| Beam / notes | Cooling: Water cooled |
| pulse | duration, / high |
| Ave power stability (rms, 4 hours±3℃) | <2%, <1% |
| Warm-up time (minutes) | <10 |
| Transverse mode | TEM00 |
| Beam divergence, full angle (mrad) | <1 |
| M2 | <1.3 |
| Polarization ratio | >100:1 Vertical |
| Cooled method | Water cooled |
| Operating temperature (℃) | 15-35 |
| Power supply (100-240VAC) | RAD1PS |
| Expected lifetime (hours) | >10000 |
| Wavelength (nm) | 1064±1 |
| Average power (W) | 1-60 |
| Single pulse energy (uJ) | 200μJ@200kHz;60μJ@1MHz;40μJ@1.5MHz |
| Rep. Rate | 0.2-10MHz |
| Pulse duration (ns) | 2-10ns@1.5MHz |
| Peak power (MW) | 1-20 |
| Beam diameter at the aperture (1/e2,mm) | <3 |
| M² | <1.3 |
| Beam height from base plate (mm) | 114 |
Application context
Applications named on this model’s datasheet, expanded with the model’s optical specifications.
NS-FH-1064: Sapphire marking depends on how optical energy is delivered to the target; 1064 nm emission governs absorption, while the listed temporal parameter (200 uJ) governs peak intensity and heat deposition.
NS-FH-1064: 1064 nm emission determines compatible optics, coatings and detectors for Ceramic cutting. The catalogued beam parameter (TEM00) helps predict how the source will focus and propagate through the instrument.
NS-FH-1064: 1064 nm emission determines compatible optics, coatings and detectors for Semiconductor cutting. The catalogued beam parameter (TEM00) helps predict how the source will focus and propagate through the instrument.
NS-FH-1064: 1064 nm emission determines compatible optics, coatings and detectors for Film scribing. The catalogued beam parameter (TEM00) helps predict how the source will focus and propagate through the instrument.
System integration
Use these checks to connect NS-FH-1064 to the surrounding optical, mechanical and control system. Every value shown is taken from this model's own specification record.
Technical FAQ
Cooled method: Water cooled · Operating temperature (℃): 15-35. Provide the stated cooling method and keep the laser-head base thermally coupled; temperature drift moves wavelength, output power and beam pointing.
Transverse mode: TEM00 · Beam divergence, full angle (mrad): <1. Size the downstream optics from the stated beam diameter and divergence rather than from the aperture of the housing, and confirm the polarisation state before specifying isolators or polarising optics.
Share wavelength, operating mode, output power or pulse energy, linewidth or pulse width, delivery, control, and safety requirements and we will qualify the matching configuration and lead time.
Model selection
Compare NS-FH-1064 with the closest available models in the Pulsed Lasers family. Confirm option-dependent values on the final configuration before ordering.
| Selection parameter | NS-FH-1064 (current) | FS-H- 10 64A | FS-H- 10 64B |
|---|---|---|---|
| Wavelength | 1064 nm | 1064 nm | 1064 nm |
| Optical power / pulse energy | 200 uJ | 1-500 mW | 500-5000 mW |
| Operating mode / pulse width | 0.2-10 MHz | Pulsed | Pulsed |
| Beam quality | TEM00 | TEM00 | TEM00 |
Compare the NS-FH-1064 with nearby pulsed lasers across the wavelength range.
Choosing a laser
Which specifications decide the experiment, and which ones cost money without changing the result.
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