Sapphire marking
NS-FH-532: Sapphire marking depends on how optical energy is delivered to the target; 532 nm emission governs absorption, while the listed temporal parameter (100 uJ) governs peak intensity and heat deposition.
Pulse energy, repetition rate, pulse width
NS-FH-532532 nm green pulsed laser
532 nmNS-FH-532 is a 532 nm Pulsed laser. Used for sapphire marking, ceramic cutting, semiconductor cutting, film scribing. Cooling: Water cooled. Key specifications: pulse energy 100 uJ, repetition rate 0.2-10 MHz, pulse width 2-10 ns @1.5 MHz. View specifications, datasheet and enquiry options from Precisometer.
Specifications
NS-FH-532
24 specification rows
| Pulse energy | 100 uJ |
|---|---|
| Repetition rate | 0.2-10 MHz |
| Pulse width | 2-10 ns @1.5 MHz |
| Beam / notes | Cooling: Water cooled |
| Operating mode | Pulsed |
| Average power | 1-30 |
| Ave power stability (rms, 4 hours±3℃) | <2%, <1% |
| Warm-up time (minutes) | <10 |
| Transverse mode | TEM00 |
| M2 | <1.3 |
| Beam divergence, full angle (mrad) | <1 |
| Polarization ratio | >100:1 Horizontal |
| Cooled method | Water cooled |
| Operating temperature (℃) | 10-35 |
| Power supply (100-240VAC) | RAD1PS |
| Expected lifetime (hours) | >10000 |
| Wavelength (nm) | 532±1 |
| Single pulse energy (uJ) | 100μJ@200kHz；30μJ@1MHz；20μJ@1.5MHz |
| Rep. rate | 0.2-10MHz |
| Pulse duration (ns) | 2-10@1.5MHz |
| Peak power (MW) | 1-20 |
| M² | <1.3 |
| Beam diameter at the aperture (1/e2,mm) | <3 |
| Beam height from base plate (mm) | 114 |
Application context
Why this design is used
Applications named on this model’s datasheet, expanded with the model’s optical specifications.
Ceramic cutting
NS-FH-532: 532 nm emission determines compatible optics, coatings and detectors for Ceramic cutting. The catalogued beam parameter (TEM00) helps predict how the source will focus and propagate through the instrument.
Semiconductor cutting
NS-FH-532: 532 nm emission determines compatible optics, coatings and detectors for Semiconductor cutting. The catalogued beam parameter (TEM00) helps predict how the source will focus and propagate through the instrument.
Film scribing
NS-FH-532: 532 nm emission determines compatible optics, coatings and detectors for Film scribing. The catalogued beam parameter (TEM00) helps predict how the source will focus and propagate through the instrument.
System integration
Integration and compatibility
Use these checks to connect NS-FH-532 to the surrounding optical, mechanical and control system. Every value shown is taken from this model's own specification record.
- Thermal management
- Cooled method: Water cooled · Operating temperature (℃): 10-35
- Provide the stated cooling method and keep the laser-head base thermally coupled; temperature drift moves wavelength, output power and beam pointing.
- Beam parameters at the output
- Transverse mode: TEM00 · M2: <1.3
- Size the downstream optics from the stated beam diameter and divergence rather than from the aperture of the housing, and confirm the polarisation state before specifying isolators or polarising optics.
Technical FAQ
Integration questions for NS-FH-532
What cooling does the NS-FH-532 require?
Cooled method: Water cooled · Operating temperature (℃): 10-35. Provide the stated cooling method and keep the laser-head base thermally coupled; temperature drift moves wavelength, output power and beam pointing.
What beam does the NS-FH-532 deliver?
Transverse mode: TEM00 · M2: <1.3. Size the downstream optics from the stated beam diameter and divergence rather than from the aperture of the housing, and confirm the polarisation state before specifying isolators or polarising optics.
Need this configured?
Share wavelength, operating mode, output power or pulse energy, linewidth or pulse width, delivery, control, and safety requirements and we will qualify the matching configuration and lead time.
Model selection
Nearby series comparison
Compare NS-FH-532 with the closest available models in the Pulsed Lasers family. Confirm option-dependent values on the final configuration before ordering.
| Selection parameter | NS-FH-532 (current) | FS-H- 5 32A | FS-H- 5 32B |
|---|---|---|---|
| Wavelength | 532 nm | 532 nm | 532 nm |
| Optical power / pulse energy | 100 uJ | 1-100 mW | 100-2000 mW |
| Operating mode / pulse width | 0.2-10 MHz | Pulsed | Pulsed |
| Beam quality | TEM00 | TEM00 | TEM00 |
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Compare the NS-FH-532 with nearby pulsed lasers across the wavelength range.
