Power stability, linewidth, beam quality
UV-D-355355 nm UV CW laser
355 nmUV-D-355 is a 355 nm CW laser. Used for semiconductor wafer inspection, grating interference lithography, doe direct writing, flow cytometry. Features: Water cooled. Key specifications: output / average power 2~5 W, spectral linewidth <0.08 nm, power stability <1%. View specifications, datasheet and enquiry options from Precisometer.
Specifications
UV-D-355
19 specification rows
| Output / average power | 2~5 W |
|---|---|
| Spectral linewidth | <0.08 nm |
| Power stability | <1% |
| Beam / notes | Features: Water cooled |
| Operating mode | CW |
| Beam divergence, full angle (mrad) | <4.5 |
| M2 | <1.5 |
| Polarization ratio | >100:1 Horizontal |
| Warm-up time (minutes) | <10 |
| Cooled method | Water cooled |
| Operating Temperature (°C) | 10-35 |
| Operating voltage (VDC) | DC 36V/ 19.6A |
| Expected lifetime (hours) | >10000 |
| Wavelength (nm) | 355±1 |
| Output power (W) | 2-5 |
| Beam Circularity (%) | >80 |
| Beam diameter at the aperture (1/e2, mm) | ~2 |
| M² | <1.5 |
| Beam height from base plate (mm) | 98 |
Applications
Uses named on this model’s datasheet.
- Semiconductor wafer inspection
- Grating interference lithography
- DOE direct writing
- Flow cytometry
- Spectrum analysis
- Precision physics experiments
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