Power stability, linewidth, beam quality
UV-D-355355 nm UV CW laser
355 nmUV-D-355 is a 355 nm CW laser. Used for semiconductor wafer inspection, grating interference lithography, doe direct writing, flow cytometry. Features: Water cooled. Key specifications: output / average power 2~5 W, spectral linewidth <0.08 nm, power stability <1%. View specifications, datasheet and enquiry options from Precisometer.
Specifications
UV-D-355
13 specification rows
| Wavelength | 355 nm |
|---|---|
| Output / average power | 2~5 W |
| Spectral linewidth | <0.08 nm |
| Power stability | <1% |
| Beam / notes | Features: Water cooled |
| Operating mode | CW |
| Beam divergence, full angle (mrad) | <4.5 |
| M2 | <1.5 |
| Polarization ratio | >100:1 Horizontal |
| Warm-up time (minutes) | <10 |
| Cooled method | Water cooled |
| Operating Temperature (°C) | 10-35 |
| Operating voltage (VDC) | DC 36V/ 19.6A |
| Expected lifetime (hours) | >10000 |
Applications
Uses named on this model’s datasheet.
- Semiconductor wafer inspection
- Grating interference lithography
- DOE direct writing
- Flow cytometry
- Spectrum analysis
- Precision physics experiments
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Share wavelength, operating mode, output power or pulse energy, linewidth or pulse width, delivery, control, and safety requirements and we will qualify the matching configuration and lead time.
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