Marking
EO-XS-355: Marking depends on how optical energy is delivered to the target; 355 nm emission governs absorption, while the listed temporal parameter (1~50 uJ) governs peak intensity and heat deposition.
Pulse energy, repetition rate, pulse width
EO-XS-355 is a 355 nm Pulsed laser. Used for marking, carving, measure, research. Key specifications: output / average power 1~2 W, pulse energy 1~50 uJ, repetition rate 1-100 kHz. View specifications, datasheet and enquiry options from Precisometer.
Specifications
21 specification rows
| Output / average power | 1~2 W |
|---|---|
| Pulse energy | 1~50 uJ |
| Repetition rate | 1-100 kHz |
| Pulse width | ~4 ns @40 kHz |
| Operating mode | Electro-optic Q-switched |
| Ave power stability (over 4 hours) | <5%, <3% |
| Warm-up time (minutes) | <10 |
| Beam divergence, full angle (mrad) | <3 |
| Cooled method | Air cooled |
| Operating temperature (℃) | 10~35 |
| Power supply (220/110VAC) | PSU-AOM(3U) |
| Expected lifetime (hours) | 10000 |
| Warranty period | 1 year |
| Wavelength (nm) | 355±1 |
| Average power (W) | 1~2W (2W@40kHz) |
| Single pulse energy (µJ) | 1~50(50μJ @40kHz) |
| Rep. rate (kHz) | 1~100 |
| Pulse duration (ns) | ~4@40kHz |
| Peak power (kW) | 1~12.5(12.5kW@40kHz) |
| Beam diameter at the aperture (1/e2,mm) | ~1.5 |
| Beam height from base plate (mm) | 101 |
Application context
Applications named on this model’s datasheet, expanded with the model’s optical specifications.
EO-XS-355: Marking depends on how optical energy is delivered to the target; 355 nm emission governs absorption, while the listed temporal parameter (1~50 uJ) governs peak intensity and heat deposition.
EO-XS-355: 355 nm emission determines compatible optics, coatings and detectors for Carving. The catalogued beam parameter (<3) helps predict how the source will focus and propagate through the instrument.
EO-XS-355: Measure benefits from a stable, focusable source. 355 nm emission fixes the compatible coatings and detector response, while the listed beam characteristic (<3) informs waist size and propagation.
EO-XS-355: 355 nm emission determines compatible optics, coatings and detectors for Research. The catalogued beam parameter (<3) helps predict how the source will focus and propagate through the instrument.
System integration
Use these checks to connect EO-XS-355 to the surrounding optical, mechanical and control system. Every value shown is taken from this model's own specification record.
Technical FAQ
Cooled method: Air cooled · Operating temperature (℃): 10~35. Provide the stated cooling method and keep the laser-head base thermally coupled; temperature drift moves wavelength, output power and beam pointing.
Beam divergence, full angle (mrad): <3 · Beam diameter at the aperture (1/e2,mm): ~1.5. Size the downstream optics from the stated beam diameter and divergence rather than from the aperture of the housing, and confirm the polarisation state before specifying isolators or polarising optics.
Share wavelength, operating mode, output power or pulse energy, linewidth or pulse width, delivery, control, and safety requirements and we will qualify the matching configuration and lead time.
Model selection
Compare EO-XS-355 with the closest available models in the Pulsed Lasers family. Confirm option-dependent values on the final configuration before ordering.
| Selection parameter | EO-XS-355 (current) | MPL-FN-355 | MPL-F-355 |
|---|---|---|---|
| Wavelength | 355 nm | 355 nm | 355 nm |
| Optical power / pulse energy | 1~2 W | 1~30 mW | 1~100 mW |
| Operating mode / pulse width | 1-100 kHz | 10 Hz-3 kHz | 1-7 kHz |
| Beam quality | <3 | TEM00 | TEM00 |
Compare the EO-XS-355 with nearby pulsed lasers across the wavelength range.
Choosing a laser
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