Back to Home

Pulse energy, repetition rate, pulse width

EO-355-Subnano -Hi355 nm UV Q-switched pulsed laser

355 nm

EO-355-Subnano -Hi is a 355 nm Pulsed laser. Used for scientific research, film stripping, tissue ablation. Key specifications: output / average power 1~3 W, pulse energy 1~600 uJ, repetition rate 100 Hz-10 kHz. View specifications, datasheet and enquiry options from Precisometer.

Specifications

EO-355-Subnano -Hi

16 specification rows

Output / average power1~3 W
Pulse energy1~600 uJ
Repetition rate100 Hz-10 kHz
Pulse width<1.5 ns @5 kHz
Power stability (rms, 4 hours, ±3℃)<5%
energydiode / pumped / all / solid
Beam diameter (mm)~1.5mm
Beam divergence, full angle (mrad)≤3mrad
Cooled methodAir cooled or water cooled
Warm-up time (minutes)<15
Operating voltage (VDC)24V/21A
Operating temperature (℃)15-30
Expected lifetime (hours)>10000
Wavelength (nm)355±1
Operating modeActively Q-switched
Rep. rate100Hz-10kHz

Application context

Why this design is used

Applications named on this model’s datasheet, expanded with the model’s optical specifications.

Scientific research

EO-355-Subnano -Hi: 355 nm emission determines compatible optics, coatings and detectors for Scientific research. The catalogued beam parameter (≤3mrad) helps predict how the source will focus and propagate through the instrument.

Film stripping

EO-355-Subnano -Hi: 355 nm emission determines compatible optics, coatings and detectors for Film stripping. The catalogued beam parameter (≤3mrad) helps predict how the source will focus and propagate through the instrument.

Tissue ablation

EO-355-Subnano -Hi: Tissue ablation depends on how optical energy is delivered to the target; 355 nm emission governs absorption, while the listed temporal parameter (1~600 uJ) governs peak intensity and heat deposition.

System integration

Integration and compatibility

Use these checks to connect EO-355-Subnano -Hi to the surrounding optical, mechanical and control system. Every value shown is taken from this model's own specification record.

Thermal management
Cooled method: Air cooled or water cooled · Operating temperature (℃): 15-30
Provide the stated cooling method and keep the laser-head base thermally coupled; temperature drift moves wavelength, output power and beam pointing.
Beam parameters at the output
Beam diameter (mm): ~1.5mm · Beam divergence, full angle (mrad): ≤3mrad
Size the downstream optics from the stated beam diameter and divergence rather than from the aperture of the housing, and confirm the polarisation state before specifying isolators or polarising optics.

Technical FAQ

Integration questions for EO-355-Subnano -Hi

What cooling does the EO-355-Subnano -Hi require?

Cooled method: Air cooled or water cooled · Operating temperature (℃): 15-30. Provide the stated cooling method and keep the laser-head base thermally coupled; temperature drift moves wavelength, output power and beam pointing.

What beam does the EO-355-Subnano -Hi deliver?

Beam diameter (mm): ~1.5mm · Beam divergence, full angle (mrad): ≤3mrad. Size the downstream optics from the stated beam diameter and divergence rather than from the aperture of the housing, and confirm the polarisation state before specifying isolators or polarising optics.

Need this configured?

Share wavelength, operating mode, output power or pulse energy, linewidth or pulse width, delivery, control, and safety requirements and we will qualify the matching configuration and lead time.

Open laser selector

Model selection

Nearby series comparison

Compare EO-355-Subnano -Hi with the closest available models in the Pulsed Lasers family. Confirm option-dependent values on the final configuration before ordering.

Selection parameterEO-355-Subnano -Hi (current)MPL-FN-355MPL-F-355
Wavelength355 nm355 nm355 nm
Optical power / pulse energy1~3 W1~30 mW1~100 mW
Operating mode / pulse width100 Hz-10 kHz10 Hz-3 kHz1-7 kHz
Beam quality≤3mradTEM00TEM00