Fiber output, PM options, seed formats
FL-H-1030-PS1030 nm near-infrared high-power fiber laser
1030 nmFL-H-1030-PS is a 1030 nm Fiber laser. Used for sapphire marking, ceramic cutting, semiconductor cutting, film scribing. Picosecond Pulsed Infrared Laser. Key specifications: operating mode Pulsed, output / average power 1~20 W, single pulse energy (nj) 1-500. View specifications, datasheet and enquiry options from Precisometer.
Specifications
FL-H-1030-PS
22 specification rows
| Operating mode | Pulsed |
|---|---|
| Output / average power | 1~20 W |
| Beam / notes | Picosecond Pulsed Infrared Laser |
| Single pulse energy (nJ) | 1-500 |
| Rep. Rate( | 20-120 |
| Ave power stability (rms, 4 hours±3℃) | <2%, <1% |
| Warm-up time (minutes) | <10 |
| Transverse mode | TEM00 |
| Beam divergence, full angle (mrad) | <1 |
| M2 | <1.2 |
| Polarization ratio | >100:1 Vertical |
| Cooled method | Water cooled |
| Operating temperature (℃) | 15-35 |
| Power supply (100-240VAC) | RAD1PS |
| Expected lifetime (hours) | >10000 |
| Wavelength (nm) | 1030±1 |
| Average power (W) | 1-20 |
| Pulse duration (ps) | <10 |
| Peak power (MW) | 1-50 |
| Beam diameter at the aperture (1/e2,mm) | ~2 |
| M² | <1.2 |
| Beam height from base plate (mm) | 118 |
Applications
Uses named on this model’s datasheet.
- Sapphire marking
- Ceramic cutting
- Semiconductor cutting
- Film scribing
- Physics experiment
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