Pulse energy, repetition rate, pulse width

AO-K-289/1-5uJ289 nm deep-UV Q-switched pulsed laser

289 nm

AO-K-289/1-5uJ is a 289 nm Pulsed laser. Used for micro-electronics, metrology, material processing, laser medical treatment. High beam quality �� AO-K- 289 AO-K- 289 �� Q-switched UV Laser AO-K -289/ 1-5uJ/ 1~50mW High beam quality �� . Key specifications: operating mode Q-switched, output / average power 1~50 mW. View specifications, datasheet and enquiry options from Precisometer.

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Specifications

AO-K-289/1-5uJ

3 specification rows

Wavelength	289 nm
Operating mode	Q-switched
Output / average power	1~50 mW
Beam / notes	High beam quality �� AO-K-289 AO-K-289 �� Q-switched UV Laser AO-K-289/ 1-5 uJ/ 1~50 mW High beam quality ��

Series-level technical context

Engineering context for a thin Pulsed Lasers record

This model has no standalone PDF and only a small number of model-specific rows. The values below are traceable context from 12 wavelength-near pulsed lasers records; they define the parameters to qualify, but are not substituted for an order-specific datasheet.

Typical operating fields in the series

• Output / average power: 1~10 mW
• Output / average power: 1~50 mW
• Output / average power: 100 mW
• Pulse duration(ps): <500
• Operating mode: Passively Q-switched

Beam-quality tolerance context

Nearby series records state Beam divergence, full angle (mrad): <3.5 and Beam divergence, full angle (mrad): <25. These are series context, not guaranteed values for AO-K-289/1-5uJ; confirm them on the order-specific datasheet.

Optical integration schematic

Step 1Pump and pulsed laser head
Step 2Safety shutter and optional isolator
Step 3Beam-expansion or focusing optics
Step 4Sample with synchronized trigger or detector

Application context

Why this design is used

Applications named on a datasheet for this product line, interpreted against this model’s listed wavelength and beam data.

Micro-electronics

AO-K-289/1-5uJ: 289 nm emission determines compatible optics, coatings and detectors for Micro-electronics. Beam quality, divergence and pointing stability should be checked against the experiment geometry.

Metrology

AO-K-289/1-5uJ: 289 nm emission determines compatible optics, coatings and detectors for Metrology. Beam quality, divergence and pointing stability should be checked against the experiment geometry.

Material processing

AO-K-289/1-5uJ: Material processing depends on how optical energy is delivered to the target; 289 nm emission governs absorption, while pulse energy, duration and repetition rate governs peak intensity and heat deposition.

Laser medical treatment

AO-K-289/1-5uJ: 289 nm emission determines compatible optics, coatings and detectors for Laser medical treatment. Beam quality, divergence and pointing stability should be checked against the experiment geometry.

Need this configured?

Share wavelength, operating mode, output power or pulse energy, linewidth or pulse width, delivery, control, and safety requirements and we will qualify the matching configuration and lead time.

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Model selection

Nearby series comparison

Compare AO-K-289/1-5uJ with the closest available models in the Pulsed Lasers family. Confirm option-dependent values on the final configuration before ordering.

Selection parameter	AO-K-289/1-5uJ (current)	PS-L-295	PS-M-295
Wavelength	289 nm	295 nm	295 nm
Optical power / pulse energy	1~50 mW	1~10 mW	1~50 mW
Operating mode / pulse width	Q-switched	<500	Passively Q-switched
Beam quality	Confirm for this model	Confirm for this model	Confirm for this model

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Compare the AO-K-289/1-5uJ with nearby pulsed lasers across the wavelength range.