System architecture
| Laser sources | Single- or multi-wavelength | Builds the excitation set required by the instrument |
| Thermal management | TC-01 active control or TC-02 passive heat sink | Stabilizes source temperature and removes waste heat |
| Optical isolation | Free-space Faraday isolator | Reduces destabilizing back-reflection into the laser |
| Beam gating | Mechanical shutter | Provides TTL-controlled exposure or safety gating |
| Fast modulation | Acousto-optic modulator | Controls intensity at higher repetition rates |
| Beam delivery | Free-space or fiber coupling | Matches the platform to the downstream optical path |
Free-space isolator options
| C-HP-3-405 | 405 nm | ±10 nm | >90% | 3 mm | ≥25 dB |
| C-HP-2-532 | 532 nm | ±10 nm | >93% | 2 mm | ≥25 dB |
| C-HP-3-633 | 633 nm | ±10 nm | >93% | 3 mm | ≥25 dB |
| C-HP-2.3-785 | 785 nm | ±10 nm | >93% | 2.3 mm | ≥25 dB |
Mechanical shutter interface
| Aperture diameter | 4.0 mm |
| Typical beam diameter | 2.0 mm |
| Operating frequency | 0–10 Hz |
| Maximum laser power | <3 W |
| Rise / fall time | Approximately 8 ms / 8 ms |
| External modulation | TTL |
| Drive voltage | 5 VDC or 12 VDC |
Acousto-optic modulator interface
| Wavelength | 450–700 nm |
| Optical power | Typically <1 W at 1.0 mm beam diameter |
| Transmission | 93% |
| Center frequency | 100 MHz |
| Diffraction efficiency | 80% |
| Active aperture | 1.0 mm |
| Extinction ratio | ≥1000:1 |
| Pulse repetition frequency | 4 MHz |
| RF power | 1.2 W |
| Input impedance | 50 Ω |
| Controller drive voltage | 24 VDC |
| External modulation | TTL or analog |