SLM, narrow linewidth, coherence
UV-FN-320-X is a 320 nm Single-Frequency laser. Used for high - precision measurement, biomedical detection, semiconductor microfabrication, flow cytometry. M²: <1.2. Key specifications: output / average power 1~50 mW, spectral linewidth <1 MHz, optical noise <0.25%. View specifications, datasheet and enquiry options from Precisometer.
Specifications
21 specification rows
| Output / average power | 1~50 mW |
|---|---|
| Spectral linewidth | <1 MHz |
| Optical noise | <0.25% |
| M² | <1.2 |
| Operating mode | CW |
| Power stability (rms, 4 hours±3℃) | <1%, <0.5% |
| Transverse mode | TEM00 |
| Beam diameter at the aperture (1/e2, mm) | ~0.7 |
| Beam divergence, full angle (mrad) | <1.0 |
| Polarization ratio | >100:1, Vertical (Horizontal optional) |
| Pointing Stability Over Temperature(μrad/°C) | <8 |
| Operating Temperature (°C) | 10-35 |
| Operating voltage (VDC) | 12V |
| Expected lifetime (hours) | >10000 |
| Wavelength (nm) | 320±1 |
| Output power (mW) | 1-50 |
| Noise of amplitude (rms, 20Hz-20MHz) | <0.25% |
| Peak-to-Peak Noise (20 Hz to 20 kHz) | <1% |
| Warm-up time (minutes) | <10 |
| Pointing Stability(μrad) (over 2 hours after warm-up and ±3°C) | <30 |
| Beam height from base plate (mm) | 19 |
Application context
Applications named on this model’s datasheet, expanded with the model’s optical specifications.
UV-FN-320-X: High - precision measurement benefits from a stable, focusable source. 320 nm emission fixes the compatible coatings and detector response, while the listed beam characteristic (<1.2) informs waist size and propagation.
UV-FN-320-X: 320 nm emission determines compatible optics, coatings and detectors for Biomedical detection. The catalogued beam parameter (<1.2) helps predict how the source will focus and propagate through the instrument.
UV-FN-320-X: 320 nm emission determines compatible optics, coatings and detectors for Semiconductor microfabrication. The catalogued beam parameter (<1.2) helps predict how the source will focus and propagate through the instrument.
UV-FN-320-X: 320 nm emission can be matched to the absorption or excitation band used in Flow cytometry. The stated stability or noise figure (<0.25%) helps keep measured intensity changes attributable to the sample rather than source drift.
System integration
Use these checks to connect UV-FN-320-X to the surrounding optical, mechanical and control system. Every value shown is taken from this model's own specification record.
Technical FAQ
Operating Temperature (°C): 10-35. Provide the stated cooling method and keep the laser-head base thermally coupled; temperature drift moves wavelength, output power and beam pointing.
M²: <1.2 · Transverse mode: TEM00. Size the downstream optics from the stated beam diameter and divergence rather than from the aperture of the housing, and confirm the polarisation state before specifying isolators or polarising optics.
Share wavelength, operating mode, output power or pulse energy, linewidth or pulse width, delivery, control, and safety requirements and we will qualify the matching configuration and lead time.
Model selection
Compare UV-FN-320-X with the closest available models in the Single-Frequency Lasers family. Confirm option-dependent values on the final configuration before ordering.
Compare the UV-FN-320-X with nearby single-frequency lasers across the wavelength range.
Choosing a laser
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