Contrast & permanence
Material response defines wavelength and fluence.
Shape matter and flow · Industry & flow
UV marking and micro-processing
Create high-contrast, small-feature marks with less heat in the part.
Application focusContrast & permanence
Low heat load
UV absorption and short pulses limit collateral heating.
Repeatable throughput
Balance scan speed, repetition rate, spot, and field size.
Why the source matters
Short UV pulses are useful for high contrast marks on plastics, cassettes, slides, PCB materials, and heat-sensitive substrates.
The correct source is defined at the sample or process—not at the laser aperture. Wavelength and operating mode set the interaction; stability, delivery, timing, and control determine whether it stays useful in the complete system.
Light in355 nm common, 266 and 532 nm alternatives
InteractionIlluminate or process
ResultContrast & permanence
Application workflow
Design from the result backward.
Three decisions turn the application into a practical source specification.
Prove the material response
Test the actual polymer, glass, ceramic, coating, cassette, slide, or PCB.
Build the process window
Vary wavelength, pulse energy, repetition rate, spot, overlap, and scan speed.
Engineer the station
Specify scanner, lens, field, focus, extraction, fixturing, vision, and enclosure.
Selection guide
Match the architecture to the experiment.
These are starting architectures. Precisometer qualifies the final wavelength, output, delivery, control, and integration package against your setup.
- Wavelength band
- 355 nm common, 266 and 532 nm alternatives
- Operating mode
- Q-switched UV or green
Heat-sensitive polymer
355 nm nanosecond pulses are a strong start for high-contrast marking.
Smaller feature
Evaluate deeper UV or shorter pulses against cost, throughput, and optics.
Validated production
Use sample trials to lock the source and scan recipe before station design.
Source architecture
Platform families to qualify.
248-400 nm CW and pulsed options
Deep-UV and high-power UV lasers
For UV absorption, polymer marking, inspection, and fine material processing.
Cold processingSmall heat affected zoneHigh contrast marking
213, 266, 355, 532, 1064 nm and custom
Nanosecond and sub-nanosecond pulsed lasers
For applications controlled by pulse energy, timing, spot size, and peak power.
High peak powerVariable repetition rateAir-cooled formats
Ready to specify
Bring us the application—not a guessed model number.
Ask for material, mark size, contrast target, throughput, scan field, enclosure, and required validation samples.
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