355 nm UV
Match common matrices and instrument optics.
Reveal composition · Spectroscopy & analysis
MALDI-TOF mass spectrometry
Deliver stable UV pulses for repeatable desorption and efficient ionization.
Application focus355 nm UV
Stable ns pulses
Hold desorption and ion yield across acquisition.
Trigger & lifetime
Fit pulse-on-demand behavior and service expectations.
Why the source matters
MALDI ionization needs UV pulses with stable energy, short duration, controlled repetition rate, and repeatable beam quality.
The correct source is defined at the sample or process—not at the laser aperture. Wavelength and operating mode set the interaction; stability, delivery, timing, and control determine whether it stays useful in the complete system.
Light in355 nm UV, ns pulse class
InteractionProbe matter
Result355 nm UV
Application workflow
Design from the result backward.
Three decisions turn the application into a practical source specification.
Define the matrix and spot
Establish matrix absorption, sample geometry, beam size, and fluence range.
Control every pulse
Set energy, pulse width, stability, repetition rate, attenuation, and pulse-on-demand behavior.
Fit the TOF instrument
Confirm triggering, jitter, footprint, beam routing, environment, and expected lifetime.
Selection guide
Match the architecture to the experiment.
These are starting architectures. Precisometer qualifies the final wavelength, output, delivery, control, and integration package against your setup.
- Wavelength band
- 355 nm UV, ns pulse class
- Operating mode
- Q-switched pulsed
Core MALDI source
A 355 nm Q-switched platform in the nanosecond class matches the established architecture.
Variable-throughput system
Choose a controllable repetition range and attenuation strategy across assay modes.
OEM design-in
Lock mechanical, electrical, timing, and lifetime requirements before qualification.
Source architecture
Platform families to qualify.
213, 266, 355, 532, 1064 nm and custom
Nanosecond and sub-nanosecond pulsed lasers
For applications controlled by pulse energy, timing, spot size, and peak power.
High peak powerVariable repetition rateAir-cooled formats
248-400 nm CW and pulsed options
Deep-UV and high-power UV lasers
For UV absorption, polymer marking, inspection, and fine material processing.
Cold processingSmall heat affected zoneHigh contrast marking
Ready to specify
Bring us the application—not a guessed model number.
Ask for matrix, pulse energy, repetition rate, pulse width, beam size, trigger format, and instrument integration.
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