Power stability, linewidth, beam quality
UV-FN-320-X320 nm UV narrow-linewidth CW laser
320 nmUV-FN-320-X is a 320 nm CW laser. Used for high - precision measurement, biomedical detection, semiconductor microfabrication, flow cytometry. Key specifications: output / average power 1~50 mW, spectral linewidth <1 MHz, power stability <1%. View specifications, datasheet and enquiry options from Precisometer.
Specifications
UV-FN-320-X
22 specification rows
| Output / average power | 1~50 mW |
|---|---|
| Spectral linewidth | <1 MHz |
| Power stability | <1% |
| Optical noise | <0.25% |
| Operating mode | CW |
| Transverse mode | TEM00 |
| M2 | <1.2 |
| Beam diameter at the aperture (1/e2, mm) | ~0.7 |
| Beam divergence, full angle (mrad) | <1.0 |
| Polarization ratio | >100:1, Vertical (Horizontal optional) |
| Pointing Stability Over Temperature(μrad/°C) | <8 |
| Operating Temperature (°C) | 10-35 |
| Operating voltage (VDC) | 12V |
| Expected lifetime (hours) | >10000 |
| Wavelength (nm) | 320±1 |
| Output power (mW) | 1-50 |
| M² | <1.2 |
| Noise of amplitude (rms, 20Hz-20MHz) | <0.25% |
| Peak-to-Peak Noise (20 Hz to 20 kHz) | <1% |
| Warm-up time (minutes) | <10 |
| Pointing Stability(μrad) (over 2 hours after warm-up and ±3°C) | <30 |
| Beam height from base plate (mm) | 19 |
Applications
Uses named on this model’s datasheet.
- High - precision measurement
- Biomedical detection
- Semiconductor microfabrication
- Flow cytometry
- Raman spectroscopy
- Photoluminescence
- Confocal
- Super - resolution fluorescence microscopy
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